The Ni-P/TiO2 composite film on sintered NdFeB permanent magnet was investigated by X-ray diffraction (XRD),environmental scanning electron microscopy (ESEM),and energy dispersive X-ray spectrometer (EDX). The c...The Ni-P/TiO2 composite film on sintered NdFeB permanent magnet was investigated by X-ray diffraction (XRD),environmental scanning electron microscopy (ESEM),and energy dispersive X-ray spectrometer (EDX). The corrosion resistance of Ni-P/TiO2 film coated on NdFeB magnet,in 0.5 mol/L NaCl solution,was studied by potentiodynamic polarization,salt spray test and electrochemical impedance spectroscopy (EIS) techniques. The self-corrosion current density (icorr) and the polarization resistance (Rp) of Ni-P/TiO2 film are 0.22 μA/cm2 (about 14% of that of Ni-P coating),and 120 kΩ·cm2 (about 2 times of that of Ni-P coating),respectively. The anti-salt spray time of Ni-P/TiO2 film is about 2.5 times of that of the Ni-P coating. The results indicate that Ni-P/TiO2 film has a better corrosion resistance than Ni-P coating,and the composite film increases the corrosion resistance of NdFeB magnet markedly.展开更多
Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor(VDMOS) devices with composite SiO2-Si3N4 film gates are investigated.The relationships amon...Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor(VDMOS) devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.展开更多
A NiP/TiO2 composite film on carbon steel was prepared by electroless plating and sol-gel composite process. An artificial neural network was applied to optimize the prepared condition of the composite film. Corrosion...A NiP/TiO2 composite film on carbon steel was prepared by electroless plating and sol-gel composite process. An artificial neural network was applied to optimize the prepared condition of the composite film. Corrosion behavior of the NiP/TiO2 composite film was investigated by polarization resistance measurement, anode polarization, ESEM (environmental scanning electron microscopy) and EIS (electrochemical impedance spectroscopy) measurements. Results showed that the NiP/ TiO2 composite film has a good corrosion resistance in 0.5mol/L H2SO4 solution. The element valence of the composite film was characterized by XPS (X-ray photoelectron spectroscopy) spectrum, and an anticorrosion mechanism of the composite film was discussed.展开更多
A novel three-dimensional photocatalyst, TiO2 particulate film immobilized on activated carbon fibers (TiOE/ACFs), was prepared by liquid phase deposition. The photocatalyst was characterized by SEM, XRD, BET surfac...A novel three-dimensional photocatalyst, TiO2 particulate film immobilized on activated carbon fibers (TiOE/ACFs), was prepared by liquid phase deposition. The photocatalyst was characterized by SEM, XRD, BET surface area and photodegradation of methylene blue solution. TiO2 particulate film, with a thickness of nearly 200 nm and grain sizes of 30-50 nm, was deposited on almost each carbon fiber. The inner space between adjacent fibers remained as unmodified ACFs, therefore, both UV illumination and polluted solutions were allowed to pass through the felt-form photocatalyst to form a three-dimensional environment for photocatalytic reactions. With BET surface areas of 400-600 m^2/g, the TiOE/ACFs exhibited an enhanced adsorption of pollutants for photocatalysis. Comparative degradations indicated that photocatalytic activity of the TiOE/ACFs was slightly higher than that of Degussa P-25 TiO2. Two special properties, the three-dimensional structure and combined effects of ACFs' adsorption and titania's photodegradation, made contribution to high photocatalytic activity. Additionally, the TiOE/ACFs exhibited high stability and potentially application for practical usage.展开更多
TiO2-SiO2 thin films have been prepared on slide glass substrates by sol-gel method, and the effect of SiO2 additive on photo-generated hydrophilicity of TiO2 thin film was investigated by measuring the contact angle ...TiO2-SiO2 thin films have been prepared on slide glass substrates by sol-gel method, and the effect of SiO2 additive on photo-generated hydrophilicity of TiO2 thin film was investigated by measuring the contact angle of water, the microstructure, the transmittance, the photocatalytic activity and the specific surface area . The results showed that 10mol% of SiO2 additive was the most effective for decreasing contact angle of water. The SiO2 additive of less than 30mol% has a suppressive effect on the crystal growth of anatase in calcinations, resulting in a large surface area. Consequently, the super-hydrophilicity was improved.展开更多
In order to improve the corrosion resistance and biocompatibility of NiTi surgical alloy, TiO2 and TiO2-SiO2 thin films were prepared by sol-gel method. The surface characteristics of the film, which include surface c...In order to improve the corrosion resistance and biocompatibility of NiTi surgical alloy, TiO2 and TiO2-SiO2 thin films were prepared by sol-gel method. The surface characteristics of the film, which include surface composition, microstructure and surface morphology, were studied by X-ray diffraction (XRD), atomic force microscopy (AFM) and X-ray photoelectron spectra (XPS), respectively. A scratching test was used to assess the interface adhesive strength between the film and substrate. The corrosion resistance of NiTi alloy coated with oxide films were studied by anodic polarization curves measurement in biological solution. Additionally, a preliminary study of the in vitro bioactivity of the films was conducted. The results indicated that TiO2 and TiO2-SiO2 (Ti/Si=4:1) films have higher electrochemical corrosion resistance and can be used as protective layers on NiTi alloy. In addition, TiO2-SiO2 composite films have better bioactivity than TiO2 film.展开更多
A new TiO2 modified film on carbon steel was prepared by electroless plating and sol gel composite process. An artificial neural net was used to optimize the preparing condition of the film. The optimized condition of...A new TiO2 modified film on carbon steel was prepared by electroless plating and sol gel composite process. An artificial neural net was used to optimize the preparing condition of the film. The optimized condition of the TiO2-modified film on carbon steel is as follows: plating time of NiP is 50 min, number of dip coating is 4, heat treatment time is 2 h, and the molar ratio of complexing reagent to Ti(OC4 H9)4 is 1.5 : 1. Corrosion behavior of carbon steel with coating was investigated by polarization resistance measurement, anode polarization, EIS and ESEM measurement. XPS was used to characterize the element valence of the modified film. Results show that carbon steel with TiO2 modified film has good corrosion resistance in 0.5 mol/L of H2SO4 solution and 0.5 mol/L of NaCl solution. It is also found that the preparing condition of forming TiO2-modified film can be obtained easily by the artificial neural net.展开更多
The photo-induced hydrophilicity of SiO2 overlayer on TiO2 films prepared by sol-gel method was investigated by means of soak angle measurement, XPS, UV-VIS and FTIR spectra. The results show that, compared with the T...The photo-induced hydrophilicity of SiO2 overlayer on TiO2 films prepared by sol-gel method was investigated by means of soak angle measurement, XPS, UV-VIS and FTIR spectra. The results show that, compared with the TiO2 film without SiO2 overlayer, when the TiO2 film is thoroughly covered by SiO2 overlayer, the hydrophilicity and the sustained effect are enhanced. It is found that the significant growth of the OH- group occurs in the surface of SiO2 overlayer. The different mechanism of enhanced hydrophilicity between SiO2 overlayer on TiO2 films and TiO2/SiO2 mixing films was analyzed. The result suggests that the photo-generated electrons created in the interface between TiO2 and SiO2 tend to reduce the Ti(Ⅳ) cation to the Ti(Ⅲ) state, and the photogenerated holes transmit through the SiO2 layer to uppermost surface efficiently. Once the holes go up to the surface, they tend to make the surface hydrophilic. The stable hydrophilicity of SiO2 overlayer which adsorbs more stable OH groups, enhances the sustained effect, i.e. the super-hydrophilic state can be maintained for a long time in dark place.展开更多
A novel two-dimensional nanopattemed TiO2 thin film has been synthesized through the interaction between cationic Gemini surfactant molecules and the prepared TiO2 colloid nanoparticles with average diameters of 8 nm ...A novel two-dimensional nanopattemed TiO2 thin film has been synthesized through the interaction between cationic Gemini surfactant molecules and the prepared TiO2 colloid nanoparticles with average diameters of 8 nm by controlling the surface pressure of the monolayer. TEM photographs from the formed Gemini-TiO2 composite monolayer confirm that the prepared TiO2 film is of a branch nanopattern.展开更多
After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature(~240°C), larger crystallization activation energy(6.22 e V), and better data...After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature(~240°C), larger crystallization activation energy(6.22 e V), and better data retention ability(189°C for 10 y). The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb(3 nm)/SiO_2(7 nm)-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb(3 nm)/SiO_2(7 nm) thin film shows a low thermal conductivity of 0.13 W/(m·K).展开更多
Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma s...Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.展开更多
TiO2 films were formed on metallic titanium substrates by the anodic oxidation method in H2SO4 solution under the 80V D.C..Phase component and microstructure were characterized by X-ray diffraction (XRD) and scanning ...TiO2 films were formed on metallic titanium substrates by the anodic oxidation method in H2SO4 solution under the 80V D.C..Phase component and microstructure were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM).Water contact angles on titanium oxide film surface were measured under both dark and sunlight illumination conditions.Corrosion tests were carried out in seawater under different illumination conditions by electrochemistry impedance spectrum (EIS) and polarization curves.The result showed that the TiO2 film prepared by the anodic oxidation method was anatase with a uniform structure and without obvious pores or cracks on its surface.The average water contact angle of the film was 116.4? in dark, in contrast to an angle of 42.7? under the UV illumination for 2 hours, which demonstrates good hydrophobic property.The anti-corrosion behavior of the TiO2 film was declining with the extended immersion time.Under dark conditions, however, the hydrophobic TiO2 film retarded the water infiltrating into the substrate.The impedance changed slowly and the corrosion current density was 2 orders of magnitude lower than that with the film illuminated by sunlight.All of those mentioned above indicate that the TiO2 film possesses much better performance under dark condition, and it can be applied as an engineering material under dark seawater environment.展开更多
Although scaling will continue for couple of decades but device geometries reaches to atomic size and limitation of quantum mechanical physical boundaries. To address these problems there is need of innovation in mate...Although scaling will continue for couple of decades but device geometries reaches to atomic size and limitation of quantum mechanical physical boundaries. To address these problems there is need of innovation in material science & engineering, device structure, and new nano devices based on different principle of physics. So TiO2 thin films have been grown on well clean N-type silicon substrates via a sol–gel spin coating method. MOS capacitor were fabricated and characterized with SiO2 and TiO2 as dielectric material on N-type silicon wafer. The thickness was measured by stylus profiler and found to be 510 ? and 528 ? for SiO2 and TiO2 respectively. Some of the material parameters were found from the measured Capacitance -Voltage (C-V) curve obtained by SUPREM-III (Stanford University Process Engineering Model Version 0-83) for SiO2 and C-V Keithly 590 analyzer for TiO2 thin films. The result shows that obtained TiO2 film present a dielectric constant of approximately 80. The refractive index was found to be 2.4 and optical constant was 5.43 obtained from Ellipsometry. Band gap 3.6 eV of TiO2 was calculated by spectrophotometer and Surface morphology was obtained using Scanning Electron Microscope (SEM-JEOL) micrograph. The aluminum (Al) metal was deposited by the thermal evaporation system on the back side of the sample for the ohmic contact. Analysis shows that TiO2 may be acceptable as a viable substitute for high k dielectric in order to prevent the tunneling current problems.展开更多
By means of scanning electron microscope(SEM)and high voltage electron microscope(HVEM)we have observed and analysed morphology and micro-structure of silicon oxide film with different thickness formed on(111)silicon ...By means of scanning electron microscope(SEM)and high voltage electron microscope(HVEM)we have observed and analysed morphology and micro-structure of silicon oxide film with different thickness formed on(111)silicon monocrystal under dry oxygen atmosphere at 1100℃.Compared with their oxidation kinetic curves consisted of three stages,we suggested a mechanism on forming silicon oxide film.According to electron and X-ray diffraction analyses the silicon oxide films consisted of silica with different crystal structure.We also have discussed a stacking fault and a dislocation formed in the Si-Sio_2 interface region simulaneously forming silicon oxide film.展开更多
基金Sponsored by Hi-Tech Research and Development Program of China (2003AA305120)
摘要The Ni-P/TiO2 composite film on sintered NdFeB permanent magnet was investigated by X-ray diffraction (XRD),environmental scanning electron microscopy (ESEM),and energy dispersive X-ray spectrometer (EDX). The corrosion resistance of Ni-P/TiO2 film coated on NdFeB magnet,in 0.5 mol/L NaCl solution,was studied by potentiodynamic polarization,salt spray test and electrochemical impedance spectroscopy (EIS) techniques. The self-corrosion current density (icorr) and the polarization resistance (Rp) of Ni-P/TiO2 film are 0.22 μA/cm2 (about 14% of that of Ni-P coating),and 120 kΩ·cm2 (about 2 times of that of Ni-P coating),respectively. The anti-salt spray time of Ni-P/TiO2 film is about 2.5 times of that of the Ni-P coating. The results indicate that Ni-P/TiO2 film has a better corrosion resistance than Ni-P coating,and the composite film increases the corrosion resistance of NdFeB magnet markedly.
摘要Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor(VDMOS) devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.
摘要A NiP/TiO2 composite film on carbon steel was prepared by electroless plating and sol-gel composite process. An artificial neural network was applied to optimize the prepared condition of the composite film. Corrosion behavior of the NiP/TiO2 composite film was investigated by polarization resistance measurement, anode polarization, ESEM (environmental scanning electron microscopy) and EIS (electrochemical impedance spectroscopy) measurements. Results showed that the NiP/ TiO2 composite film has a good corrosion resistance in 0.5mol/L H2SO4 solution. The element valence of the composite film was characterized by XPS (X-ray photoelectron spectroscopy) spectrum, and an anticorrosion mechanism of the composite film was discussed.
摘要A novel three-dimensional photocatalyst, TiO2 particulate film immobilized on activated carbon fibers (TiOE/ACFs), was prepared by liquid phase deposition. The photocatalyst was characterized by SEM, XRD, BET surface area and photodegradation of methylene blue solution. TiO2 particulate film, with a thickness of nearly 200 nm and grain sizes of 30-50 nm, was deposited on almost each carbon fiber. The inner space between adjacent fibers remained as unmodified ACFs, therefore, both UV illumination and polluted solutions were allowed to pass through the felt-form photocatalyst to form a three-dimensional environment for photocatalytic reactions. With BET surface areas of 400-600 m^2/g, the TiOE/ACFs exhibited an enhanced adsorption of pollutants for photocatalysis. Comparative degradations indicated that photocatalytic activity of the TiOE/ACFs was slightly higher than that of Degussa P-25 TiO2. Two special properties, the three-dimensional structure and combined effects of ACFs' adsorption and titania's photodegradation, made contribution to high photocatalytic activity. Additionally, the TiOE/ACFs exhibited high stability and potentially application for practical usage.
基金Funded by Key Scientific and Technological Items of the Ministry of Education (No.99087) .
摘要TiO2-SiO2 thin films have been prepared on slide glass substrates by sol-gel method, and the effect of SiO2 additive on photo-generated hydrophilicity of TiO2 thin film was investigated by measuring the contact angle of water, the microstructure, the transmittance, the photocatalytic activity and the specific surface area . The results showed that 10mol% of SiO2 additive was the most effective for decreasing contact angle of water. The SiO2 additive of less than 30mol% has a suppressive effect on the crystal growth of anatase in calcinations, resulting in a large surface area. Consequently, the super-hydrophilicity was improved.
基金This work was supported by the National Natural Science Foundation of China(No.50081001)the Education Department Project of Liaoning Province(No.202073425).
摘要In order to improve the corrosion resistance and biocompatibility of NiTi surgical alloy, TiO2 and TiO2-SiO2 thin films were prepared by sol-gel method. The surface characteristics of the film, which include surface composition, microstructure and surface morphology, were studied by X-ray diffraction (XRD), atomic force microscopy (AFM) and X-ray photoelectron spectra (XPS), respectively. A scratching test was used to assess the interface adhesive strength between the film and substrate. The corrosion resistance of NiTi alloy coated with oxide films were studied by anodic polarization curves measurement in biological solution. Additionally, a preliminary study of the in vitro bioactivity of the films was conducted. The results indicated that TiO2 and TiO2-SiO2 (Ti/Si=4:1) films have higher electrochemical corrosion resistance and can be used as protective layers on NiTi alloy. In addition, TiO2-SiO2 composite films have better bioactivity than TiO2 film.
摘要A new TiO2 modified film on carbon steel was prepared by electroless plating and sol gel composite process. An artificial neural net was used to optimize the preparing condition of the film. The optimized condition of the TiO2-modified film on carbon steel is as follows: plating time of NiP is 50 min, number of dip coating is 4, heat treatment time is 2 h, and the molar ratio of complexing reagent to Ti(OC4 H9)4 is 1.5 : 1. Corrosion behavior of carbon steel with coating was investigated by polarization resistance measurement, anode polarization, EIS and ESEM measurement. XPS was used to characterize the element valence of the modified film. Results show that carbon steel with TiO2 modified film has good corrosion resistance in 0.5 mol/L of H2SO4 solution and 0.5 mol/L of NaCl solution. It is also found that the preparing condition of forming TiO2-modified film can be obtained easily by the artificial neural net.
摘要The photo-induced hydrophilicity of SiO2 overlayer on TiO2 films prepared by sol-gel method was investigated by means of soak angle measurement, XPS, UV-VIS and FTIR spectra. The results show that, compared with the TiO2 film without SiO2 overlayer, when the TiO2 film is thoroughly covered by SiO2 overlayer, the hydrophilicity and the sustained effect are enhanced. It is found that the significant growth of the OH- group occurs in the surface of SiO2 overlayer. The different mechanism of enhanced hydrophilicity between SiO2 overlayer on TiO2 films and TiO2/SiO2 mixing films was analyzed. The result suggests that the photo-generated electrons created in the interface between TiO2 and SiO2 tend to reduce the Ti(Ⅳ) cation to the Ti(Ⅲ) state, and the photogenerated holes transmit through the SiO2 layer to uppermost surface efficiently. Once the holes go up to the surface, they tend to make the surface hydrophilic. The stable hydrophilicity of SiO2 overlayer which adsorbs more stable OH groups, enhances the sustained effect, i.e. the super-hydrophilic state can be maintained for a long time in dark place.
基金supported by the National Natural Science Foundation of China(No.20473057)Shanghai Nanotechnology Promotion Center(No.0352nm094,No.0452nm088).
摘要A novel two-dimensional nanopattemed TiO2 thin film has been synthesized through the interaction between cationic Gemini surfactant molecules and the prepared TiO2 colloid nanoparticles with average diameters of 8 nm by controlling the surface pressure of the monolayer. TEM photographs from the formed Gemini-TiO2 composite monolayer confirm that the prepared TiO2 film is of a branch nanopattern.
基金Supported by the National Natural Science Foundation of China under Grant No 11774438the Natural Science Foundation of Jiangsu Province under Grant No BK20151172+2 种基金the Changzhou Science and Technology Bureau under Grant No CJ20160028the Qing Lan Project,the Opening Project of State Key Laboratory of Silicon Materials under Grant No SKL2017-04the Opening Project of Key Laboratory of Microelectronic Devices and Integrated Technology of Institute of Microelectronics of Chinese Academy of Sciences
摘要After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature(~240°C), larger crystallization activation energy(6.22 e V), and better data retention ability(189°C for 10 y). The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb(3 nm)/SiO_2(7 nm)-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb(3 nm)/SiO_2(7 nm) thin film shows a low thermal conductivity of 0.13 W/(m·K).
基金Project supported by the National Natural Science Foundation of China (Grant Nos 50842028 and 50972012)the National Basic Research Program of China (Grant No 2007CB613301)
摘要Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.
摘要TiO2 films were formed on metallic titanium substrates by the anodic oxidation method in H2SO4 solution under the 80V D.C..Phase component and microstructure were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM).Water contact angles on titanium oxide film surface were measured under both dark and sunlight illumination conditions.Corrosion tests were carried out in seawater under different illumination conditions by electrochemistry impedance spectrum (EIS) and polarization curves.The result showed that the TiO2 film prepared by the anodic oxidation method was anatase with a uniform structure and without obvious pores or cracks on its surface.The average water contact angle of the film was 116.4? in dark, in contrast to an angle of 42.7? under the UV illumination for 2 hours, which demonstrates good hydrophobic property.The anti-corrosion behavior of the TiO2 film was declining with the extended immersion time.Under dark conditions, however, the hydrophobic TiO2 film retarded the water infiltrating into the substrate.The impedance changed slowly and the corrosion current density was 2 orders of magnitude lower than that with the film illuminated by sunlight.All of those mentioned above indicate that the TiO2 film possesses much better performance under dark condition, and it can be applied as an engineering material under dark seawater environment.
摘要Although scaling will continue for couple of decades but device geometries reaches to atomic size and limitation of quantum mechanical physical boundaries. To address these problems there is need of innovation in material science & engineering, device structure, and new nano devices based on different principle of physics. So TiO2 thin films have been grown on well clean N-type silicon substrates via a sol–gel spin coating method. MOS capacitor were fabricated and characterized with SiO2 and TiO2 as dielectric material on N-type silicon wafer. The thickness was measured by stylus profiler and found to be 510 ? and 528 ? for SiO2 and TiO2 respectively. Some of the material parameters were found from the measured Capacitance -Voltage (C-V) curve obtained by SUPREM-III (Stanford University Process Engineering Model Version 0-83) for SiO2 and C-V Keithly 590 analyzer for TiO2 thin films. The result shows that obtained TiO2 film present a dielectric constant of approximately 80. The refractive index was found to be 2.4 and optical constant was 5.43 obtained from Ellipsometry. Band gap 3.6 eV of TiO2 was calculated by spectrophotometer and Surface morphology was obtained using Scanning Electron Microscope (SEM-JEOL) micrograph. The aluminum (Al) metal was deposited by the thermal evaporation system on the back side of the sample for the ohmic contact. Analysis shows that TiO2 may be acceptable as a viable substitute for high k dielectric in order to prevent the tunneling current problems.
摘要By means of scanning electron microscope(SEM)and high voltage electron microscope(HVEM)we have observed and analysed morphology and micro-structure of silicon oxide film with different thickness formed on(111)silicon monocrystal under dry oxygen atmosphere at 1100℃.Compared with their oxidation kinetic curves consisted of three stages,we suggested a mechanism on forming silicon oxide film.According to electron and X-ray diffraction analyses the silicon oxide films consisted of silica with different crystal structure.We also have discussed a stacking fault and a dislocation formed in the Si-Sio_2 interface region simulaneously forming silicon oxide film.