期刊文献+
任意字段
题名或关键词
题名
关键词
摘要
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息
共找到506篇文章
< 1 2 … 26 >
每页显示 20 50 100
已选0条
引用分析
参考文献
引证文献
 统计分析
检索结果
已选文献
显示方式：
Constructing high-entropy spinel oxide thin films via magnetron sputtering for efficiently electrocatalyzing alkaline oxygen evolution reaction 认领 引用
1
作者 Yuhui Chen Congbao Guo +2 位作者 Yi Wang Kun Wang Shuqin Song 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 2025年第10期210-219,共10页
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang... Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)3O4 grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)3O4)exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm–2 and steadily operates at 100 mA cm–2 for 200 h with a decay of only 272μV h–1,which is far better than that of commercial IrO2 catalyst(290 mV,1090μV h–1).Tetramethylammonium cation(TMA+)probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)3O4 follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)3O4 is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened *OH bonding on the(FeCoNiCrMo)3O4 surface and a rapid deprotonation of *OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production. 展开更多
关键词 High entropy spinel oxide Magnetron sputtering Alkaline water electrolysis Oxygen evolution reaction
暂未订购 下载PDF
Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation 认领 引用
2
作者 Chao YE 《Plasma Science and Technology》 SCIE EI CSCD 2025年第3期111-117,共7页
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The... The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering. 展开更多
关键词 electron series resonance magnetron sputtering radio-frequency discharge
暂未订购 下载PDF
Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures 认领 引用 被引量：1
3
作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology（防务技术）》 SCIE EI CAS CSCD 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
暂未订购 下载PDF
Magnetron sputtering NiOx for perovskite solar cells 认领 引用 被引量：1
4
作者 Xiangyi Shen Xinwu Ke +2 位作者 Yingdong Xia Qingxun Guo Yonghua Chen 《Journal of Semiconductors》 EI CAS CSCD 2025年第5期48-63,共16页
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke... Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiOx has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiOx as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiOx thin film, the key parameters affecting the optoelectronic properties of NiOx thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiOx and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiOx technology and the possible development opportunities were concluded and discussed. 展开更多
关键词 magnetron sputtering NiOx perovskite solar cells
暂未订购 下载PDF
Solution for Environmentally Friendly Silver Surface Magnetron Sputtering Color Titanium Film Layer Technology 认领 引用
5
作者 Huan Zhu Krisada Daoruang Chalisa Apiwathnasorn 《Journal of Environmental & Earth Sciences》 CAS 2025年第1期562-572,共11页
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el... Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology. 展开更多
关键词 Environmental Protection Magnetron Sputtering Silver Colored Film Titanium Film Layer
暂未订购 下载PDF
Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems 认领 引用 被引量：11
6
作者 Jun Zhou Zhe Wu Zhanhe Liu 《Journal of University of Science and Technology Beijing》 2008年第6期775-781,共7页
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputterin... Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system （CFUBMS） has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The＇key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface. 展开更多
关键词 magnetron sputtering closed-field unbalanced magnetron sputtering system （CFUBMS） ion-to-atom ratio unbalancedmagnetron sputtering
暂未订购 下载PDF
Recent Developments in Magnetron Sputtering 认领 引用 被引量：6
7
作者 于翔 王成彪 +2 位作者 刘阳 于德洋 邢廷炎 《Plasma Science and Technology》 SCIE EI CAS 2006年第3期337-343,共7页
The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetro... The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films. 展开更多
关键词 balanced and unbalanced magnetron sputtering mid-frequency magnetron sputtering ion assisted sputtering
暂未订购 下载PDF
Magnetic properties and microstructures of terbium coated and grain boundary diffusion treated sintered Nd-Fe-B magnets by magnetron sputtering 认领 引用 被引量：17
8
作者 Wei Zhu Yang Luo +3 位作者 Zilong Wang Xinyuan Bai Haijun Peng Dunbo Yu 《Journal of Rare Earths》 SCIE EI CAS CSCD 2021年第2期167-173,共7页
Tb coating on the surface of commercial sintered Nd-Fe-B magnet was prepared by DC magnetron sputtering.The secondary heat treatment was used to regulate the microstructure for the enhancement of coercivity,namely dif... Tb coating on the surface of commercial sintered Nd-Fe-B magnet was prepared by DC magnetron sputtering.The secondary heat treatment was used to regulate the microstructure for the enhancement of coercivity,namely diffusion treatment and annealing treatment.The coercivity increases significantly from 18.3 to 28.0 kOe,the remanence decreases slightly from 14.1 to 14.0 kGs,and the comprehensive magnetic properties are higher than 75(Hcj+(BH)max=76.7).SEM results indicate that,on the one hand,950℃is the optimal diffusion temperature.Lower diffusion temperature results in insufficient diffusion of Tb element.Higher diffusion temperature can lead to the main phase grain growth,the decrease of Nd-rich phase,and forming holes in the magnet.On the other hand,500℃is the optimal annealing temperature.Lower annealing temperature can result in the reduction of Nd-rich phase.Higher annealing temperature can generate the non-defined Nd-rich thin layer between grains. 展开更多
关键词 Sintered Nd-Fe-B magnets Magnetron sputtering Tb coating Magnetic properties Rare earths
暂未订购 下载PDF
Corrosion and wear resistance of AZ31 Mg alloy treated by duplex process of magnetron sputtering and plasma electrolytic oxidation 认领 引用 被引量：14
9
作者 Bing-jian WEI Yu-lin CHENG +2 位作者 Yuan-yuan LIU Zhun-da ZHU Ying-liang CHENG 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2021年第8期2287-2306,共20页
In order to improve the wear and corrosion resistance of AZ31 magnesium alloy,a magnetron-sputtered Al layer with a thickness of 11μm was firstly applied on the alloy,and then treated by plasma electrolytic oxidation... In order to improve the wear and corrosion resistance of AZ31 magnesium alloy,a magnetron-sputtered Al layer with a thickness of 11μm was firstly applied on the alloy,and then treated by plasma electrolytic oxidation(PEO)in an aluminate and silicate electrolytes,respectively.The performance of PEO coatings was investigated by dry sliding wear and electrochemical corrosion tests.The aluminate coating exhibits excellent wear resistance under both 10 and 20 N loads.The silicate coating only shows low wear rate under 10 N,but it was destroyed under 20 N.Corrosion tests show that the Al layer after magnetron sputtering treatment alone cannot afford good protection to the Mg substrate.However,the duplex layer of PEO/Al can significantly improve the corrosion resistance of AZ31 alloy.Electrochemical tests show that the aluminate and silicate coatings have corrosion current densities of-1.6×10-6 and-1.1×10-6 A/cm2,respectively,which are two orders lower than that of the un-coated AZ31 alloy.However,immersion tests and electrochemical impedance spectroscopy(EIS)show that the aluminate coating exhibits better long-term corrosion protection than silicate coating. 展开更多
关键词 AZ31 magnesium alloy magnetron sputtering plasma electrolytic oxidation dry sliding wear corrosion
暂未订购 下载PDF
Al-doped ZnO/WO3 heterostructure films prepared by magnetron sputtering for isopropanol sensors 认领 引用 被引量：9
10
作者 Wei-Xiang Gao Xue-Ting Chang +5 位作者 Xiao-Jie Zhu Jun-Feng Li Ying-Chang Jiang Dong-Sheng Wang Chuan-Xiao Yang Shi-Bin Sun 《Rare Metals》 SCIE EI CAS CSCD 2024年第1期247-256,共10页
Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to ... Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO3 heterostructure films by directly depositing the AZO coating onto the WO3 coating using a strategy of magnetron sputtering. The AZO/WO3 heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO3 heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO3 heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO3 coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors. 展开更多
关键词 Metal oxide semiconductors Gas sensors Aldoped ZnO/WO3 Heterostructure films Isopropanol Magnetron sputtering
暂未订购 下载PDF
Effects of substrate temperature and deposition time on the morphology and corrosion resistance of FeCoCrNiMo0.3 high-entropy alloy coating fabricated by magnetron sputtering 认领 引用 被引量：16
11
作者 Chun-duo Dai Yu Fu +1 位作者 Jia-xiang Guo Cui-wei Du 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2020年第10期1388-1397,共10页
The effects of substrate temperature and deposition time on the morphology and corrosion resistance of FeCoCrNiMo0.3 coating fabricated by magnetron sputtering were investigated by scanning electron microscopy and ele... The effects of substrate temperature and deposition time on the morphology and corrosion resistance of FeCoCrNiMo0.3 coating fabricated by magnetron sputtering were investigated by scanning electron microscopy and electrochemical tests.The FeCoCrNiMo0.3 coating was mainly composed of the face-centered cubic phase.High substrate temperature promoted the densification of the coating,and the pitting resistance and protective ability of the coating in 3.5wt%NaCl solution was thus improved.When the deposition time was prolonged at 500℃,the thickness of the coating remarkably increased.Meanwhile,the pitting resistance improved as the deposition time increased from 1 to 3 h;however,further improvement could not be obtained for the coating sputtered for 5 h.Overall,the pitting resistance of the FeCoCrNiMo0.3 coating sputtered at 500℃for 3 h exceeds those of most of the reported high-entropy alloy coatings. 展开更多
关键词 high-entropy alloy coating magnetron sputtering microstructure corrosion
暂未订购 下载PDF
Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering 认领 引用 被引量：10
12
作者 代明江 韦春贝 +4 位作者 周克崧 朱敏 侯惠君 林松盛 佟鑫 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第9期3002-3011,共10页
A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of... A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1. 展开更多
关键词 W/DLC/W-S-C composite film magnetron sputtering adhesion strength friction coefficient
暂未订购 下载PDF
Influences of working pressure on properties for TiO_2 films deposited by DC pulse magnetron sputtering 认领 引用 被引量：11
13
作者 ZHANG Can DING Wanyu +2 位作者 WANG Hualin CHAI Weiping JU Dongying 《Journal of Environmental Sciences》 SCIE EI CAS 2009年第6期741-744,共4页
TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-r... TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction（XRD）,atomic force microscopy（AFM） and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in？uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase（anatase） could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum（35%） after irradiation by ultraviolet light for 1 h. 展开更多
关键词 TiO2 film anatase UV induced photocatalysis DC pulse magnetron sputtering
暂未订购 下载PDF
Surface oxidation of vanadium dioxide films prepared by radio frequency magnetron sputtering 认领 引用 被引量：9
14
作者 王学进 梁春军 +6 位作者 管康萍 李德华 聂玉昕 朱世秋 黄峰 张葳葳 成正维 《Chinese Physics B》 SCIE EI CAS 2008年第9期3512-3515,共4页
This paper reports that the thermochromic vanadium dioxide films were deposited on various transparent substrates by radio frequency magnetron sputtering, and then aged under circumstance for years. Samples were chara... This paper reports that the thermochromic vanadium dioxide films were deposited on various transparent substrates by radio frequency magnetron sputtering, and then aged under circumstance for years. Samples were characterized with several different techniques such as x-ray diffraction, x-ray photoelectron spectroscopy, and Raman, when they were fresh from sputter chamber and aged after years, respectively, in order to determine their structure and composition. It finds that a small amount of sodium occurred on the surface of vanadium dioxide films, which was probably due to sodium ion diffusion from soda-lime glass when sputtering was performed at high substrate temperature. It also finds that aging for years significantly affected the nonstoichiometry of vanadium dioxide films, thus inducing much change in Raman modes. 展开更多
关键词 surface oxidation vanadium dioxide films magnetron sputtering
暂未订购 下载PDF
Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 认领 引用 被引量：8
15
作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 AZO thin film microstructure optoelectronic properties RF magnetron sputtering
暂未订购 下载PDF
Lithium intercalation/de-intercalation behavior of a composite Sn/C thin film fabricated by magnetron sputtering 认领 引用 被引量：8
16
作者 ZHAO Lingzhi HU Shejun +2 位作者 LI Weishan LI Liming HOU Xianhua 《Rare Metals》 SCIE EI CAS 2008年第5期507-512,共6页
A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of allo... A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of alloy elements, and lithium intercalation/de-intercalation behaviors of the fabricated films were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, electron probe microanalyzer （EPMA）, X-ray photoelectron spectroscopy （XPS）, inductively coupled plasma atomic emission spectrometry （ICP）, cyclic voltammetry （CV）, and galvanostatic charge/discharge （GC） measurements. It is found that the lithium intercalation/de-intercalation behavior of the Sn film can be significantly improved by its composite with graphite. With cycling, the discharge capacity of the Sn film without composite changes from 570 mAh/g of the 2nd cycle to 270 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 90% and 95%. Nevertheless, the discharge capacity of the composite Sn/C film changes from 575 mAh/g of the 2nd cycle to 515 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 95% and 100%. The performance improvement of tin by its composite with graphite is ascribed to the retardation of the bulk tin cracking from volume change during lithium intercalation and de-intercalation, which leads to the pulverization of tin. 展开更多
关键词 lithium-ion battery anode magnetron sputtering composite film lithium intercalation/de-intercalation
暂未订购 下载PDF
Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB_2(N) Films Deposited by Reactive Magnetron Sputtering 认领 引用 被引量：7
17
作者 Y.M.Liu D.Y.Deng +4 位作者 H.Lei Z.L.Pei C.L.Jiang C.Sun J.Gong 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2015年第12期1217-1225,共9页
In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructur... In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructure and characteristics is studied systematically,including the chemical composition,crystalline structure,residual stress,surface roughness as well as the surface and the cross-section morphology.Meanwhile,nano-indentation and ball-on-disk tribometer are performed to analyze the mechanical and tribological properties of the films.The results show that the addition of nitrogen apparently leads to the change of the structure from（1 0 1） to（0 0 1） orientation then to the amorphous structure with the formation of BN phase.And the addition of nitrogen can greatly refine the grain size and microstructure of the films.Furthermore,the residual stress of the film is also found to change from tensile to compressive stress as a function of P （N2）,and the compressive stress increases with P （N2）,The WB 2（N） films with small nitrogen content,which are deposited at P （N2） of 0.004 and 0.006 Pa,exhibit better mechanical,tribological and corrosion properties than those of other films.Further increase of nitrogen content accelerates the formation of BN phase and fast decreases the film hardness.In addition,the large N 2 partial pressure gives rise to the target poisoning accompanied by the increase of the target voltage and the decrease of the deposition rate. 展开更多
关键词 Reactive magnetron sputtering Nanocomposites WB 2（N） films Residual stress Mechanical properties
暂未订购 下载PDF
Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature 认领 引用 被引量：6
18
作者 LIU Baoting ZHOU Yang +4 位作者 ZHENG Hongfang LI Mana GUO Zhe HAO Qingxun PENG Yingcai 《Rare Metals》 SCIE EI CAS CSCD 2011年第2期170-174,共5页
Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influenc... Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process. 展开更多
关键词 thin films zinc oxide magnetron sputtering oxygen structural properties optical properties
暂未订购 下载PDF
Growth and properties of hydrogenated microcrystalline silicon thin films prepared by magnetron sputtering with different substrate temperatures 认领 引用 被引量：8
19
作者 Lin-Qing Wang Wei-Yan Wang +3 位作者 Jin-Hua Huang Rui-Qin Tan Wei-Jie Song Jian-Min Chen 《Rare Metals》 SCIE EI CAS CSCD 2022年第3期1037-1042,共6页
Hydrogenated microcrystalline silicon (μcSi:H) thin films were deposited by an radio frequency (RF)(13.56 MHz) magnetron sputtering at different substrate temperatures (100–300℃), and the influences of substrate te... Hydrogenated microcrystalline silicon (μcSi:H) thin films were deposited by an radio frequency (RF)(13.56 MHz) magnetron sputtering at different substrate temperatures (100–300℃), and the influences of substrate temperature on the growth and properties ofμc-Si:H thin films were investigated. Surface roughness and crystallinity of the thin films increase as substrate temperature increases. And all thin films are at the transition region(Xc=49.2%~61.0%). Theμc-Si:H thin films deposited at lower substrate temperature (≤200℃) represent a weak(220) preferred orientation, while the thin films deposited at higher substrate temperature (≥250℃) exhibit a weak(111) preferred orientation. The μc-Si:H thin films have a dense structure, and the structural compactness of the thin films slightly increases with substrate temperature increasing. The Fourier transform infrared spectroscopy (FTIR) results indicate that theμc-Si:H thin films have a low hydrogen content (3.9 at%–5.6 at%), which is in favor of reducing light-induced degradation effect. 展开更多
关键词 μc-Si:H thin films Magnetron sputtering Substrate temperature Hydrogen content
暂未订购 下载PDF
Study on the structural,electrical and optical properties of Al-F co-doped ZnO thin films prepared by RF magnetron sputtering 认领 引用 被引量：9
20
作者 马瑞新 王目孔 +1 位作者 康勃 王永刚 《Optoelectronics Letters》 EI 2011年第1期45-48,共4页
Al and F co-doped ZnO(ZnO:(Al,F)) thin films on glass substrates are prepared by the RF magnetron sputtering with different F doping contents.The structural,electrical and optical properties of the deposited films are... Al and F co-doped ZnO(ZnO:(Al,F)) thin films on glass substrates are prepared by the RF magnetron sputtering with different F doping contents.The structural,electrical and optical properties of the deposited films are sensitive to the F doping content.The X-ray analysis shows that the films are c-axis orientated along the(002) plane with the grain size ranging from 9 nm to 13 nm.Micrographs obtained by the scanning electron microscope(SEM) show a uniform surface.The best films obtained have a resistivity of 2.16×10-3Ω·cm,while the high optical transmission is 92.0% at the F content of 2.46 wt.%. 展开更多
关键词 Aluminum Electric properties Light transmission Magnetron sputtering Optical properties Scanning electron microscopy Semiconductor doping Substrates Thin films Zinc oxide
暂未订购 下载PDF
已选0条
引用分析
参考文献
引证文献
 统计分析
检索结果
已选文献
上一页 1 2 … 26 下一页 到第 页
在线咨询 使用帮助 返回顶部 意见反馈